Springe direkt zu Inhalt

ATM - Basics of thin-film deposition and characterization

Jan 22, 2024 - Jan 24, 2024

In this Advanced Training Module, participants will learn the basics of thin film deposition and characterization. Working in pairs, students will rotate through five different experimental stations where they will grow their own thin films and practice characterizing them. Films will be deposited using two techniques: sputter deposition and thermal evaporation. Measurement of surface topology will be made through atomic force microscopy (AFM), chemical composition will be characterized through energy dispersive x-ray spectroscopy (EDXS) and finally magnetic hysteresis loops will be measured through magneto-optical Kerr effect (MOKE). Participants will have the chance to suggest their own desired multilayers for deposition or bring their own samples for characterization or, alternatively, will complete a self-contained mini-project through the course of the training module. The practical sessions will be supported by a lecture exploring the physics of thin-film growth.

Time & Location

Jan 22, 2024 - Jan 24, 2024

MLU Halle-Wittenberg - Institute of physics